Preparation and Characterization of ZnO Nanocrystalline Layers ()
ABSTRACT
This work consists on the study of the optical properties of zinc oxide layers. These Layers are
elaborated under various conditions by cathode sputtering on glass substrates and by thermal
oxidations of Zn layers deposited on different types of substrates by vacuum evaporation. The
oxidation treatments of Zn are made in oxygen atmosphere at temperatures between 400°C and
450°C for different times. The analyses by diffraction of X-rays, Optical Microscopy and Scanning
electron microscopy enabled us to understand that the zinc oxide films deposited by cathode
sputtering on a glass substrate and having a thickness of at least 240 nm and those prepared by
thermal oxidation at 450°C during 2 hours of layers of Zn on an alumina substrate are homogeneous
and consist of grains of size 30 nm. The optical transmission measurements show that the gap
is around 3.02 eV for layers obtained by oxidation and 3.3 eV for those deposited by sputtering.
These samples have a good optical transparency in the visible.
Share and Cite:
Haddad, A. , Hafidi, A. , Ain-Souya, A. , Chahmat, N. , Ganfoudi, R. and Ghers, M. (2014) Preparation and Characterization of ZnO Nanocrystalline Layers.
Journal of Materials Science and Chemical Engineering,
2, 1-6. doi:
10.4236/msce.2014.212001.
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