has been cited by the following article(s):
[1]
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Characterisation of in-situ reactive plasma-sprayed nano-(Ti, V) N composite ceramic coatings with various V concentrations
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2021 |
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[2]
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Deposition of TiCrN on silicon substrate using radio frequency magnetron sputtering
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Journal of Interfaces, Thin Films, and …,
2020 |
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[3]
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لایه نشانی تیتانیوم کروم نیترید روی زیر لایه سیلیکون به وسیله کندوپاش مگنترونی رادیو فرکانسی
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مجله فصل مشترک ها، لایه های …,
2020 |
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[4]
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Fabrication of sputtered titanium vanadium nitride (TiVN) thin films for micro-supercapacitors
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Journal of Materials Science: Materials in Electronics,
2018 |
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[5]
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Influence of V content on properties of Ti–W–V–N films
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Surface Engineering,
2018 |
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[6]
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Plasma-enhanced atomic layer deposition of titanium vanadium nitride
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2018 |
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[7]
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Titanium vanadium nitride electrode for micro-supercapacitors
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Electrochemistry Communications,
2017 |
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[8]
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Desarrollo de recubrimientos monocapa (CNx, TiBC, TiBCN) y multicapa (CrVN/TiN) mediante pulverización catódica magnetrón aplicados sobre acero AISI H13 …
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2017 |
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[9]
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Desarrollo de recubrimientos monocapa (CNx, TiBC, TiBCN) y multicapa (CrVN/TiN) mediante pulverización catódica magnetrón aplicados sobre acero AISI …
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2017 |
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[10]
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Effect of Ti Sputtering Current on Structure of TiCrN Thin Films Prepared by Reactive DC Magnetron Co-Sputtering
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Key Engineering Materials,
2016 |
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[11]
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Análisis por espectroscopía de electrones Auger de superficies metálicas recubiertas con nanocompuestos de alta dureza
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2016 |
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[12]
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Effect of codeposition parameters on the hardness and adhesion of TiVN coatings
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Ceramics International,
2015 |
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[13]
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A Review Paper on Tribological and Mechanical Properties of Ternary Nitride based Coatings
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Procedia Technology,
2014 |
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[14]
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Effects of Titanium Sputtering Current on Structure and Morphology of TiZrN Films Prepared by Reactive DC Magnetron Co-Sputtering
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Materials Sciences and Applications,
2013 |
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[1]
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Plasma-enhanced atomic layer deposition of titanium vanadium nitride
Journal of Vacuum Science & Technology A,
2018
DOI:10.1116/1.5037463
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[2]
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Plasma-enhanced atomic layer deposition of titanium vanadium nitride
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,
2018
DOI:10.1116/1.5037463
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[3]
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Effects of Titanium Sputtering Current on Structure and Morphology of TiZrN Films Prepared by Reactive DC Magnetron Co-Sputtering
Materials Sciences and Applications,
2013
DOI:10.4236/msa.2013.411086
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