ATR-FTIR and XPS Evaluation of Alkyl Immobilization by Hydrosilylation on n-Si(111) for Photoelectrochemical Cell Electrode

Toshihito Ohtake

Department of Mechanical Systems Engineering, Faculty of Engineering, Aich University of Technology, Gamagori, Japan..

DOI: 10.4236/jsemat.2013.33A002                

Abstract

An electrode development was needed with high efficiency and low costs as next generation solar cells. We attempted the electrode fabrication for a photoelectrochemical cell by immobilizing functional groups on a n-Si(111) surface. The immobilization was applied by hydrosilylation terminated with ester (hydrophobic) or carbonyl (hydrophilic) group. Results confirmed the immobilization on the Si surface by measuring ATR-FTIR and XPS.

Keywords

ATR-FTIR; XPS; Si Surface; Hydrosilylation; Immobilization; Photoelectrochemical Cell

Conflicts of Interest

The authors declare no conflicts of interest.

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