An Investigation into the Adhesion Strength of Diamond Like Carbon Multilayer Coating (DLC/TiN/Ti/Cu/Ni)

B. RAMAMOORTHY, BINU C. YELDOSE

.

DOI: 10.4236/iim.2009.13027                

Abstract

Advancement in vacuum technologies and vapor deposition processes during last decades has led to the introduction of many modern coatings on metal cutting tools. Even in such an advanced vacuum coating techniques, the failure is not due to the wear of the coating but rather due to the lack of coating adhesion to the substrate. In this work, the coating adhesion test results were performed which is based on the Rockwell indentation tests. This coating adhesion tests were performed as per VDI standards 3198, 1991 for d.c. magnetron sputter deposition of diamond like carbon multilayer coating (DLC / TiN/ Ti / Cu / Ni) on tool substrate. Multilayer coating was deposited on tool substrates at different sputtering parameters/conditions such as power density, partial pressure, substrate temperature and reactive gases. The coated multilayer films were characterized by experimental techniques such as X-ray diffractometer which measures the material deposited, micro Raman spectroscopy and TEM to check DLC, Rockwell indentation to examine adhesion strength, optical profilometer to measure thickness of coating. Ni increases the Cu adhesion on tool substrate. Cu accommodates the shear stress induced by the films / substrate and the mismatch in thermal expansion coefficient, while Ti and TiN promote better DLC bonding. As the target power was increased the adhesion strength, micro hardness and deposition rate were observed to improve. Increase in target power and substrate temperature enhances adhesion strength. Proper substrate preparation and sequence of cleaning processes are the crucial factors for the enhancement of adhesion strength. The sputter deposition conditions for the above mentioned multilayer coatings are identified in this work to get improved quality with particular reference to adhesion and surface finish.

Keywords

cleanliness, sputtering, multilayer, adhesion, micro hardness

Conflicts of Interest

The authors declare no conflicts of interest.

References

[1]	T. Arai, H. Fujita, and M. Watanabe, “Evaluation of adhesion strength of thin hard coatings,” Thin Solid Films, Vol. 154, pp. 387–401, 1987.
[2]	P. J. Burnett and D. S. Rickerby, “The relationship between hardness and scratch adhesion,” Thin Solid Films, Vol. 154, pp. 403–416, 1987.
[3]	H. Weiss, “Adhesion of advanced overlay coatings: Mechanisms and quantitative assessment,” Elsevier Surface and Coatings Technology, Vol. 71, pp. 201–207, 1995.
[4]	V. Kiryukhantsev-Korneev, J. F. Pierson, M. I. Petrzhik, M. Alnot, E. A. Levashov, and D. V. Shtansky, “Effect of nitrogen partial pressure on the structure, physical and mechanical properties of CrB2 and Cr–B–N films,” Thin Solid Films, Vol. 517, No. 8, pp. 2675–2680, 2009.
[5]	E. Bourhis, “Indentation mechanics and its application to thin film characterization,” Vacuum, Vol. 82, No. 12, pp. 1353–1359, 2008.
[6]	X. L. Pang, K. W. Gao, F. Luo, Y. Emirov, A. Alexandr Levin, A. Alex, and Volinsky, “Investigation of microstructure and mechanical properties of multi-layer Cr/Cr2O3 coatings,” Thin Solid Films, Vol. 517, No. 6, pp. 1922–1927, 2009.
[7]	D. V. Shtansky, A. N. Sheveyko, D. I. Sorokin, L. C. Lev, B. N. Mavrin, and P. V. Kiryukhantsev-Korneev, “Structure and properties of multi-component and multilayer TiCrBN/WSex coatings deposited by sputtering of TiCrB and WSe2 targets,” Surface and Coatings Technology, Vol. 202, No. 24, pp. 5953–596, 2008.
[8]	J. H. Yang, K. H. Chen, S. Q. Wang, D. H. Xiao, and C. J. Zhu, “Characteristics and performance of Ti(C, N) coatings synthesized by magnetron sputtering technique,” Journal of Alloys and Compounds, Vol. 471, No. 1, pp. 162–165, 2009.
[9]	K. Chu and Y. G. Shen, “Mechanical and tribological properties of nanostructured TiN/TiBN multilayer films,” Wear, Vol. 265, No. 3–4, pp. 516–524, 2008.
[10]	J. Gerth and U. Wiklund, “The influence of metallic interlayers on the adhesion of PVD TiN coatings on high-speed steel,” Wear, Vol. 264, No. 9–10, pp. 885–892 2008.
[11]	K. W. Chen and J. F. Lin, “The study of adhesion and nanomechanical properties of DLC films deposited on tool steel,” Thin Solid Films, Vol. 517, No. 17, pp. 4916–4920, 2009.
[12]	F. J. G. Silva, A. J. S. Fernandes, F. M. Costa, A. P. M. Baptista, and E. Pereira, “A new interlayer approach for CVD diamond coating of steel substrates,” Diamond and Related Materials, Vol. 13, pp. 828 –833, 2004.
[13]	R. L. Chii, T. K. Cheng, and M. C. Ruey, “Improvement in adhesion of diamond films on cemented WC substrate with Ti–Si interlayers,” Diamond and Related Materials, Vol. 7, pp. 1628–1632, 1998.
[14]	B. Bhusan Springer Handbook of Nano Technology, New York, pp. 709–711, 2004.
[15]	A. G. Naumovets and Y. S.Vedula, “Surface diffusion of adsorbates,” Surface Science Reports, North Holland Publishing Company, 4, 365–434, 1985.
[16]	A. Tsuchiyama, Y. Shima, and H. Hasuyama, “Adhesive strength of DLC films prepared by ionistaion method,” Surface Treatment, Vol. 5, pp. 41–49, 2002.
[17]	S. Vepfek and S. Reiprich, “A concept for the design of novel superhard coatings,” Thin Solid Films, Vol. 268, pp. 64–71, 1995.
[18]	P. H. Mayrhofer, C. Mitterer, L. Hultman, and H. Clemens, “Microstructural design of hard coatings,” A Progress in Materials Science, Vol. 51, pp. 1032–1114, 2006.
[19]	V. N. Antoniadis and N. Bilalis, “The VDI 3198 indentation test evaluation of a reliable qualitative control for layered compounds,” Journal of Materials Processing Technology, Vol. 143–144, pp. 481–485, 2003.
[20]	U. Figueroa, O. Salas, and J. Oseguera, “Deposition of AlN on Al substrates by reactive magnetron sputtering,” Surface and coatings technology, Vol. 200, No. 5–6, pp. 1768–1776, 2005.
[21]	B. Bhusan, Modern Tribology Handbook, Delta CRC Press, USA, Vol. 2, 2005.
[22]	B. Bhusan, “Handbook of tribology: materials, coatings, and surface treatments,” Mcgraw-Hill Professional, 1991.
[23]	K. Wasa, M. Kitabatake, and H. Adachi (2004) “Thin film materials technology: – Sputtering of compound materials,” Springer, William Andrew Inc publishing, New York.
[24]	S. J. Bull, “Techniques for improving thin film adhesion,” Vacuum, Vol. 43, No. 5–7, pp. 517 – 520, 1992.
[25]	S. Schiller, U. Heisig, and K. Steinfelder, “A new sputter cleaning system for metallic Substrates,” Thin Solid Films, Vol. 33, pp. 331–339, 1976.
[26]	D. M. Mattox and A. Rigney, Chapter 2, “Adhesion processes in technological applications materials science and engineering,” Vol. 83, pp. 189–195, 1986.
[27]	D. M. Mattox, “Thin film metallization of oxides in Microelectronics,” Thin Solid Films, Vol. 18, pp. 173–186, 1973.
[28]	D. M. Mattox, “Surface effects on the growth, adhesion and properties of reactively deposited hard coatings,” Surface and Coatings Technology, Vol. 81, No. 8–16, 1996.
[29]	Cerac, “The adhesion problem,” Cerac Coating Material News, Vol. 6, January – March, 1996.
[30]	H. P. Bonzel, “A surface diffusion mechanism at high temperature,” Surface Science, Vol. 21, No. 45–60, 1970.
[31]	P. G. Shewmon, “Diffusion of impurities along surfaces,” Surface Science, Vol. 6, pp. 293–296, 1967.
[32]	G. E. Rhead, “Diffusion on surfaces,” Surface Science, Vol. 47, pp. 207–221, 1975.
[33]	J. A. Enables, “Nucleation and growth of thin films: recent Progress,” Vacuum, Vol. 33l, pp. 701–705, 1983.
[34]	S. Vincent and Smentkowski, “Review trends in sputtering,” Progress in Surface Science, Vol. 64, No. 1–58, 2000.
[35]	J. Robertson, “Diamond like carbon,” Material Science and Engineering, Vol. 37, pp. 129 – 281, 2002.
[36]	D. M. Mattox and J. E. Macdonald, “Interface formation during thin film deposition,” Applied Physics, Vol. 34, No. 8, pp. 2493, 1963.
[37]	J. Robertson, “Amorphous carbon current opinion in solid state,” Materials science, Vol. 1, pp. 557–56, 1996.
[38]	J. Robertson, “Deposition mechanisms for promoting sp3 bonding in diamond like carbon, Diamond and related materials,” Vol. 2, pp. 984–989, 1993.
[39]	J. Robertson, “hard amorphous (diamond like) carbons,” Progress in Solid State Chemistry, Vol. 21, pp. 199–333, 1991.
[40]	M. W. Thompson, “Physical mechanisms of sputtering, Physics reports (review section of physics letters),” North Holland publishing Company, Vol. 69, No. 4, pp. 335– 371, 1981.
[41]	B. Bhushan and X. D Li, “Nanomechanical characterization of solid surfaces and thin films,” International Materials Reviews, Vol. 48, No. 3, pp. 125–164, 2003.
[42]	ASM, “Surface engineering of non metallic materials,” Vol. 5, ASM Handbook, ASM International, pp. 902–907, 1987.
[43]	F. X. Cheng, C. H. Jiang, and J. S. Wu, “Effect of substrate temperatures on texture in thin films by magnetron sputtering,” Materials Letters, Vol. 59, pp. 1530–1532, 2005.
[44]	P. J. Kelly and R. D. Arnell, “Magnetron sputtering: A review of recent developments and applications,” Vacuum, Vol. 6, pp. 59–72, 2000.