A Comparative Study of Bisphenol-A, Hydantoin and Cyanuric Acid Based Epoxy Resins Using XRD
Sanjay Swarup
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DOI: 10.4236/msa.2011.210204   PDF    HTML     6,358 Downloads   10,276 Views   Citations

Abstract

To evaluate the efficiency of modified epoxy resins using bisphenol-A, hydantoin & cyanuric acid & to investigate the structural change due to the presence of Nitrogen atoms in polymeric chain for improved insulating properties, weatherability etc. The samples of epoxy resin bisphenol-a, hydantoin and Cyanuric acid based was taken for X-RAY diffraction analysis. The diffraction patterns were Fourier analysed to get an exact idea about the change in the polymer structure. From X-RAY diffraction analysis it was found that all physical parameters like area of cross section, number of carbon atoms per entanglement, stiffness parameter, particle size, percentage crystallinity & electron density fluctuation, in case of bisphenol-A based epoxy resin is more than other epoxy resins; that is; as the number of nitrogen atoms increased, all the physical parameters were reducedIn the present study only X-ray diffraction patterns of bisphenol-A, hydantoin and cyanuric acid based epoxy resins were studied. However their dielectric and ultrasonic properties could also be studied to get more information about the structur With the help of X-RAY diffraction patterns, one can easily check the synthesized samples of epoxy resins. The method to investigate the structural analysis of epoxy resin was novel and could find numerous applications in surfacecoatings.

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S. Swarup, "A Comparative Study of Bisphenol-A, Hydantoin and Cyanuric Acid Based Epoxy Resins Using XRD," Materials Sciences and Applications, Vol. 2 No. 10, 2011, pp. 1516-1519. doi: 10.4236/msa.2011.210204.

Conflicts of Interest

The authors declare no conflicts of interest.

References

[1] N. Sanjeev Murthy, “Recent Developments in Polymer Characterization Using X-Ray Diffraction,” The Rigaku Journal, Vol. 21, No. 1, 2004, pp. 15-24.
[2] L. Guo, et al., “Preparation and Characterization of Chitosan Poly(Acrylic Acid) Magnetic Microspheres,” Marine Drugs, Vol. 8, No. 7, 2010, pp. 2212-2222. doi:10.3390/md8072212
[3] W.-B. Xu, et al., “Montmorillonite Nanocomposites Determined by Differential Scanning Calorimetry,” Journal of Applied Polymer Science, Vol. 88, No. 13, 2003, pp. 2932-2941.
[4] M. Grayson, “Kirk-Othmer Encyclopedia of Chemical Technology,” 3rd Edition, Wiley-Intersciense, New York, 1980.
[5] S. Swarup and S. Chandra “X-Ray Diffraction of Maleic, Fumaric and Phenolic Resins,” Indian Journal of Technology, Vol. 26, 1988, pp. 401-406.
[6] S. Swarup and A. N. Nigam, “X-Ray Diffraction Studies of Vinylferrocene and Vinylruthenocene Polymers,” Polymer Communications, Vol. 30, No. 6, 1989, pp. 190-192.
[7] E. H. Catasiff, E. B. Dee and R. Selter, (Resins Deptt, Ciba-Geigy Corp., Ardsley, New York) Mod. Plast, Vol. 55, No. 7, 1978.
[8] S. Swarup, “Fourier Analysis of X-Ray Diffraction Patterns of Epoxy and Coal Tar Blended Epoxy Resins,” Pigment & Resin Technology, Vol. 19, No. 6, 1990, p.4.
[9] R. Hussain and D. Mohammad, “X-Ray Diffraction Study of the Changes Induced during the Thermal Degradation of Poly(Methyl Methacrylate) & Poly(Methacryloyl Ch- loride),” Turkish Journal of Chemistry, Vol. 28, No. 6, 2004, pp. 725-729.
[10] R. F. Boyer and R. L. Miller, “Regularities in X-Ray Scattering Patterns from Amorphous Polymers,” Journal of Applied Polymer Science, Vol. 29, No. 12, 1984, pp. 2043-2050.
[11] R. F. Boyer and R. L. Miller, “Polymer Chain Stiffness Parameter, and Cross-Sectional Area per Chain,” Macromolecules, Vol. 10, 1977, pp. 1167. doi:10.1021/ma60059a053
[12] R. F. Boyer and R. L. Miller, “Correlations of Liquid-State Compressibility and Bulk Modulus with Cross- Sectional Area per Polymer Chain,” Macromolecules, Vol. 17, 1984, pp. 365. doi:10.1021/ma00133a019

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