Submicron Size Patterned Nickel Soft Lithographic Masters Using Aluminium Template

T. Prakash

Chettinad Hospital and Research Institute.

DOI: 10.4236/snl.2011.12007                

Abstract

Nickel masters are widely used to produce surface relief grating like patterned antireflection coatings of polysiloxane material by simple embossing process. In the present work, patterned nickel master was prepared by using aluminium template, which is a foil peeled off from the commercial compact disk. Nickel was deposited using Watts nickel bath by pulsed electrodeposition for different relaxation times on patterned aluminium template. The deposition led to the transfer of patterns of aluminium replica to the nickel deposit. After deposition, the aluminium template was etched out chemically. Observation under an optical microscope showed that the obtained pattern was highly homogenous only for T_on = 0.1 ms, T_off = 0.9 ms duty cycles as compared with other ‘on’ and ‘off’ times of pulse cycles. This simple single step cost effective nickel master can serve as stamps for the subsequent embossing process. The preparation conditions and its salient features are discussed in this paper in detail.

Keywords

Soft Lithography, Pulsed Electrodeposition, Nickel Master

Conflicts of Interest

The authors declare no conflicts of interest.

References

[1]	Y. Xia and G. M Whitesides, “Soft Lithography,” Angewandte Chemie International Edition, Vol. 37, No. 5, 1998, pp. 550-575. doi:10.1002/(SICI)1521-3773(19980316)37:5<550::AID-ANIE550>3.0.CO;2-G
[2]	Y. Xia and G. M. Whitesides, “Soft Lithography,” Annual Review of Materials Science, Vol. 28, 1998, pp. 153-184. doi:10.1146/annurev.matsci.28.1.153
[3]	E. Kim, Y. Xia, X. M. Zhao and G. M. Whitesides, “Solvent-assisted Microcontact Molding: A convenient Method for Fabricating Three-dimensional Structures on Surfaces of Polymers,” Advanced Materials, Vol. 9, No. 8, 1997, pp. 651-654. doi:10.1002/adma.19970090814
[4]	B. D. Gates and G.M. Whitesides, “Replication of Vertical Features Smaller than 2 nm by Soft Lithography,” Journal of the American Chemical Society, Vol. 125, No. 49, 2003, pp. 14986-14987. doi:10.1021/ja0367647
[5]	Q. Xu, B. T. Mayers, M. Lahav, D. V. Vezenev and G. M. Whitesides, “Approaching Zero: Using Fractured Crystals in Metrology for Replica Molding,” Journal of the American Chemical Society, Vol. 127, No. 3, 2005, pp. 854-855. doi:10.1021/ja043436d
[6]	X. M. Zhao, Y. Xia and G. M. Whitesides, “Fabrication of Three-dimensional Micro-structures: Microtransfer molding,” Advanced Materials, Vol. 8, No. 10, 1996, pp. 837-840. doi:10.1002/adma.19960081016
[7]	S. Jean, E. Menard, J. U. Park, J. Maria, M. Meitl, J. Zaumseil and J. A. Rogers, “Three-Dimensional Nanofabrication with Rubber Stamps and Conformable Photomasks,” Advanced Materials, Vol. 16, No. 15, 2004, pp. 1369-1373. doi:10.1002/adma.200400593
[8]	P. John Thomas, G. U. Kulkarni and C. N. R. Rao, “Dippen lithography using aqueous metal nanocrystal dispersions,” Journal of Materials Chemistry, Vol. 14, 2004, pp. 625-628. doi:10.1039/b311248a
[9]	M. Emmelius, G. Pawlowski and H. W. Vollmann, “Materials for Optical Data Storage,” Angewandte Chemie International Edition in English, Vol. 28, No. 11, 1989, pp. 1445-1471. doi:10.1002/anie.198914453
[10]	D. Chowdhury, A. Paul and A. Chattopadhyay, “Patterning Design in Color at the Submicron Scale,” Nano letters, Vol. 1, No. 8, 2001, pp. 409-412. doi:10.1021/nl0155678
[11]	X. Liu and G. Zangari, “High Moment FeCoNi Alloy Thin Films Fabricated by Pulsed-current Electrodeposition,” IEEE Transactions on Magnetics, Vol. 37, No. 4, 2001, pp. 1764-1766. doi: 10.1109/20.950961
[12]	H. Natter, M. Schmelzer and R. Hempelmann, “Nanocrystalline Nickel and Nickel-copper Alloys: Synthesis, Characterization, and Thermal Stability,” Journal Materials Research, Vol. 13, 1998, pp. 1186-1197. doi:10.1557/JMR.1998.0169
[13]	H. S. Tung and D. J. Friedland, “An improved thermobalance for fluorination of carbon,” Journal of Physics E: Scientific Instruments, Vol. 20, No. 2, 1987, p. 140. doi:10.1088/0022-3735/20/2/004
[14]	A. Gombert, K. Rose, A. Heinzel, W. Horbelt, C. Zanke, B. Blasi and V. Wittwer, “Antireflective Submicrometer Surface-relief Gratings for Solar Applications,” Solar Energy Materials and Solar Cells, Vol. 54, No. 1-4, 1998, pp. 333-342. doi:10.1016/S0927-0248(98)00084-1