Effects of Titanium Sputtering Current on Structure and Morphology of TiZrN Films Prepared by Reactive DC Magnetron Co-Sputtering

Abstract

TiZrN films were deposited on unheated Si (100) substrates by reactive dc magnetron co-sputtering. Titanium and zirconium metals were used as sputtering targets. Ar and N2 gas were used as sputtering gas and reactive gas, with the flow rates of 8 and 4 sccm, respectively. The Zr sputtering current was fixed at 0.6 A and Ti sputtering current varied from 0.6 to 1.2 A. The deposition time for all the deposited films was 60 min. The effects of Ti sputtering current on the structure and morphology of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron microscopy (FE-SEM) and transmission electron microscopy (TEM). It was found that all the prepared films were (Ti,Zr)N solid solution. Furthermore, the lattice parameter was found to decrease whereas the crystallite size, RMS roughness and film thickness increased with increasing Ti sputtering current. As a result, the crystallinity of the films increased what is in agreement with XRD results.

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S. Chinsakolthanakorn, A. Buranawong, S. Chiyakun and P. Limsuwan, "Effects of Titanium Sputtering Current on Structure and Morphology of TiZrN Films Prepared by Reactive DC Magnetron Co-Sputtering," Materials Sciences and Applications, Vol. 4 No. 11, 2013, pp. 689-694. doi: 10.4236/msa.2013.411086.

Conflicts of Interest

The authors declare no conflicts of interest.

References

[1] K. Chu, P. W. Shum and Y. G. Chen, “Substrate Bias Effects on Mechanical and Tribological Properties of Substitutional Solid Solution (Ti,Al)N Films Prepared by Reactive Magnetron Sputtering,” Materials Science and Engineering B, Vol. 131, 2006, pp. 62-71.
http://dx.doi.org/10.1016/j.mseb.2006.03.036
[2] R. Wuhrer and W. Y. Yeung, “Grain Refinement with Increasing Magnetron Discharge Power in Sputter Deposition of Nanostructured Titanium Nitride Coatings,” Scripta Materialia, Vol. 50, 2004, pp. 813-818.
http://dx.doi.org/10.1016/j.scriptamat.2003.12.022
[3] K. H. Lee, C. H. Park, Y. S. Yoon and J. J. Lee, “Structure and Properties of (Ti1-xCrx)N Coatings Produced by the Ion-Plating Method,” Thin Solid Films, Vol. 385, 2001, pp. 167-173.
http://dx.doi.org/10.1016/S0040-6090(00)01911-8
[4] G. S. Kim, B. S. Kim, S. Y. Lee and J. H. Hahn, “Structure and Mechanical Properties of Cr-Zr-N Films Synthesized by Closed Field Unbalanced Magnetron Sputtering with Vertical Magnetron Sources,” Surface & Coatings Technology, Vol. 200, 2005, pp. 1669-1675.
http://dx.doi.org/10.1016/j.surfcoat.2005.08.101
[5] S. M. Aouadi, T. Maeruf, R. D. Twesten, D. M. Mihut and S. L. Rohde, “Physical and Mechanical Properties of Zirconium Nitride Thin Films,” Surface & Coatings Technology, Vol. 200, 2006, pp. 3411-3417.
http://dx.doi.org/10.1016/j.surfcoat.2005.02.169
[6] H. Hasegawa, A. Kimura and T. Suzuki, “Microhardness and Structural Analysis of (TI,AI)N, (Ti,Cr)N, (Ti,Zr)N, and (TI,V)N, Films,” Journal of Vacuum Science & Technology A, Vol. 18, 2000, pp. 1038-1040.
http://dx.doi.org/10.1116/1.582296
[7] P. W. Shum, K. Y. Li, Z. F. Zhou and Y. G. Shen, “Structural and Mechanical Properties of Titanium-Aluminium Nitride Films Deposited by Reactive Close-Field Unbalanced Magnetron Sputtering,” Surface & Coatings Technology, Vol. 185, 2004, pp. 245-253.
http://dx.doi.org/10.1016/j.surfcoat.2003.12.011
[8] O. Knotek, W. D. Munz and T. Keyendecker, “Industrial Aeposition of Binary, Ternary, and Quarternary Nitrides of Titanium, Zirconium and Aluminum,” Journal of Vacuum Science & Technology A, Vol. 5, 1987, pp. 2173-2179. http://dx.doi.org/10.1116/1.574948
[9] N. Ichimiya, Y. Onishi and Y. Tanaka, “Properties and Cutting Performance of (Ti,V)N Coatings Prepared by Cathodic Arc Ion Patting,” Surface & Coatings Technology, Vol. 200, 2005, pp. 1377-1382.
http://dx.doi.org/10.1016/j.surfcoat.2005.08.026
[10] T. Deeleard, S. Chaiyakun, A. Pokaipisit and P. Limsuwan, “Effects of Vanadium Content on Structure and Chemical State of TiVN Films and Prepared by Reactive DC Magnetron Co-Sputtering,” Materials Sciences and Application, Vol. 4, 2013, pp. 556-563.
http://dx.doi.org/10.4236/msa.2013.49068
[11] J. V. Ramana, S. Kumar, C. David and V. S. Raju “Structure, Composition and Microhardness of (Ti,Zr)N and (Ti,Al)N Coatings Prepared by DC Magnetron Sputtering,” Materials Letters, Vol. 58, 2004, pp. 2553-2558.
http://dx.doi.org/10.1016/j.matlet.2004.03.020
[12] V. V. Uglov, V. M. Anishchik, S. V. Zlotski and G. Abadias, “The Phase Composition and Stress Development in Ternary Ti-Zr-N Coatings Grown by Vacuum Arc with Combining of Plasma Flows,” Surface & Coatings Technology, Vol. 200, 2006, pp. 6389-6394.
http://dx.doi.org/10.1016/j.surfcoat.2005.11.063
[13] E. W. Niu, L. Li, G. H. Lv, H. Chen, X. Z. Li, X. Z. Yang and S. Z. Yang, “Characterization of Ti-Zr-N Films Deposited by Cathodic Vacuum Arc with Different Substrate Bias,” Applied Surface Science, Vol. 254, 2008, pp. 3909-3914. http://dx.doi.org/10.1016/j.apsusc.2007.12.022
[14] L. A. Donohue, J. Cawley and J. S. Brooks, “Deposition and Characterisation of Arc-Bond Sputter TixZryN Coatings from Pure Metallic and Segmented Targets,” Surface & Coatings Technology, Vol. 72, 1995, pp. 128-138.
http://dx.doi.org/10.1016/0257-8972(94)02342-5
[15] D. Y. Wang, C. L. Chang, C. H. Hsu and H. N. Lin, “Synthesis of (Ti,Zr)N Hard Coatings by Unbalanced Magnetron Sputtering,” Surface & Coatings Technology, Vol. 130, 2000, pp. 64-68.
http://dx.doi.org/10.1016/S0257-8972(00)00675-7

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