A Thermochemical Process Using Expanding Plasma for Nitriding Thin Molybdenum Films at Low Temperature

Isabelle Jauberteau, Jean Louis Jauberteau, Said Touimi, Thérèse Merle-Méjean, Sylvain Weber, Annie Bessaudou

Centre Européen de la Céramique, Limoges, France.
Ecole des Mines, Parc de Saurupt, Nancy, France.
Université de Limoges, Limoges, France.

DOI: 10.4236/eng.2012.412109                

Abstract

The mechanical and chemical properties of transition metal nitrides are very attractive for numerous industrial applications. Thin nitride films are expected to be good diffusion barrier in microelectronic devices. Nitrogen diffuses into the whole thickness of the molybdenum film heated at low temperature and exposed to expanding plasma of (Ar-N₂-H₂) compared with pure N₂ plasma. NH_x species in the plasma are produced by different homogeneous or heterogeneous reactive mechanisms that results in an expansion of the plasma compared with pure N₂ plasma. NH_x species and probably H atoms improve the transfer of nitrogen into the metal by preventing the formation of MoO₂ oxides which act as a barrier of diffusion for nitrogen.

Keywords

Thermochemical Process; Expanding Plasma; Thin Films; Molybdenum Nitrides; Molybdenum Oxides; NHx Species

Conflicts of Interest

The authors declare no conflicts of interest.

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