Circuits and Systems

Vol.9 No.2(2018), Paper ID 82335, 13 pages

DOI:10.4236/cs.2018.92002

 

Review of the Global Trend of Interconnect Reliability for Integrated Circuit

 

Qian Lin, Haifeng Wu, Guoqing Jia

 

College of Physics and Electronic Information Engineer, Qinghai University for Nationalities, Qinghai, China
Chengdu Ganide Technology, Chengdu, China
College of Physics and Electronic Information Engineer, Qinghai University for Nationalities, Qinghai, China

 

Copyright © 2018 Qian Lin, Haifeng Wu, Guoqing Jia et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article


Lin, Q. , Wu, H. and Jia, G. (2018) Review of the Global Trend of Interconnect Reliability for Integrated Circuit. Circuits and Systems, 9, 9-21. doi: 10.4236/cs.2018.92002.

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