Open Journal of Inorganic Chemistry
Vol.6 No.3(2016), Paper ID 67968, 8
pages
DOI:10.4236/ojic.2016.63013
Ellipsometric Study of SiOx Thin Films by Thermal Evaporation
David Salazar, Roberto Soto-Molina, Eder German Lizarraga-Medina, Marco Antonio Felix, Nicola Radnev, Heriberto Márquez
Departamento de óptica, CICESE, Ensenada, México
Departamento de óptica, CICESE, Ensenada, México
Departamento de óptica, CICESE, Ensenada, México
Instituto de Ingeniería, Universidad Autónoma de Baja California, Mexicali, México
Instituto de Ingeniería, Universidad Autónoma de Baja California, Mexicali, México
Departamento de óptica, CICESE, Ensenada, México
Copyright © 2016 David Salazar, Roberto Soto-Molina, Eder German Lizarraga-Medina, Marco Antonio Felix, Nicola Radnev, Heriberto Márquez et al. This is
an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any
medium, provided the original work is properly cited.
How to Cite this Article
Salazar, D. , Soto-Molina, R. , Lizarraga-Medina, E. , Felix, M. , Radnev, N. and Márquez, H. (2016) Ellipsometric Study of SiOx Thin Films by Thermal Evaporation.
Open Journal of Inorganic Chemistry,
6, 175-182. doi:
10.4236/ojic.2016.63013.