Department of Physics and Technological Bases of Sensory Materials, V. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine, Kyiv, Ukraine
Department of Physics and Technological Bases of Sensory Materials, V. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine, Kyiv, Ukraine
Department of Physics and Technological Bases of Sensory Materials, V. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine, Kyiv, Ukraine
Copyright © 2015 Glib Dorozinsky, Tamara Doroshenko, Volodymyr Maslov et al. This is
an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any
medium, provided the original work is properly cited.
How to Cite this Article
Dorozinsky, G. , Doroshenko, T. and Maslov, V. (2015) Influence of Technological Factors on Sensitivity of Analytical Devices Based on Surface Plasmon Resonance.
Journal of Sensor Technology,
5, 54-61. doi:
10.4236/jst.2015.52006.