Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan
Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan
Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan
Copyright © 2015 Satoshi Yamauchi, Kazuhiro Ishibashi, Sakura Hatakeyama et al. This is
an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any
medium, provided the original work is properly cited.
How to Cite this Article
Yamauchi, S. , Ishibashi, K. and Hatakeyama, S. (2015) Low Resistive TiO
2 Deposition by LPCVD Using TTIP and NbF
5 in Hydrogen-Ambient.
Journal of Crystallization Process and Technology,
5, 15-23. doi:
10.4236/jcpt.2015.51003.