Journal of Surface Engineered Materials and Advanced Technology
Vol.4 No.5(2014), Paper ID 48724, 8
pages
DOI:10.4236/jsemat.2014.45030
Transfer of Machined Patterns on an Aluminum Plate to Pyrex Glass Using Reactive Ion Etching SF6 Plasma without Masks
Carlos M. Ortiz-Lima, Fernando J. Quiñones-Novelo, Alberto Jaramillo-Núñez, Jorge Castro-Ramos
Insitituto Nacional de Astrofísica, óptica y Electrónica, Puebla, México
Insitituto Nacional de Astrofísica, óptica y Electrónica, Puebla, México
Insitituto Nacional de Astrofísica, óptica y Electrónica, Puebla, México
Insitituto Nacional de Astrofísica, óptica y Electrónica, Puebla, México
Copyright © 2014 Carlos M. Ortiz-Lima, Fernando J. Quiñones-Novelo, Alberto Jaramillo-Núñez, Jorge Castro-Ramos et al. This is
an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any
medium, provided the original work is properly cited.
How to Cite this Article
Ortiz-Lima, C. , Quiñones-Novelo, F. , Jaramillo-Núñez, A. and Castro-Ramos, J. (2014) Transfer of Machined Patterns on an Aluminum Plate to Pyrex Glass Using Reactive Ion Etching SF
6 Plasma without Masks.
Journal of Surface Engineered Materials and Advanced Technology,
4, 262-269. doi:
10.4236/jsemat.2014.45030.