Department of Applied Chemistry, Faculty of Engineering, Shibaura Institute of Technology, Tokyo, Japan
Department of Applied Chemistry, Faculty of Engineering, Shibaura Institute of Technology, Tokyo, Japan
Department of Applied Chemistry, Faculty of Engineering, Shibaura Institute of Technology, Tokyo, Japan
Copyright © 2014 T. Ohishi, S. Sone, K. Yanagida et al. This is
an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any
medium, provided the original work is properly cited.
How to Cite this Article
Ohishi, T. , Sone, S. and Yanagida, K. (2014) Preparation and Gas Barrier Characteristics of Polysilazane-Derived Silica Thin Films Using Ultraviolet Irradiation.
Materials Sciences and Applications,
5, 105-111. doi:
10.4236/msa.2014.53015.