Materials Sciences and Applications
Vol.4 No.11(2013), Paper ID 39741, 6
pages
DOI:10.4236/msa.2013.411086
Effects of Titanium Sputtering Current on Structure and Morphology of TiZrN Films Prepared by Reactive DC Magnetron Co-Sputtering
Somchai Chinsakolthanakorn, Adisorn Buranawong, Surasing Chiyakun, Pichet Limsuwan
Department of Physics, Faculty of Science, King Mongkut’s University of Technology Thonburi, Bangkok, Thailand
Department of Physics, Faculty of Science, Burapha University, Chonburi, Thailand
Department of Physics, Faculty of Science, Burapha University, Chonburi, Thailand
Department of Physics, Faculty of Science, King Mongkut’s University of Technology Thonburi, Bangkok, Thailand; Thailand Center of Excellence in Physics, Commission on Higher Education, Ministry of Education, Bangkok, Thailand
Copyright © 2013 Somchai Chinsakolthanakorn, Adisorn Buranawong, Surasing Chiyakun, Pichet Limsuwan et al. This is
an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any
medium, provided the original work is properly cited.
How to Cite this Article
S. Chinsakolthanakorn, A. Buranawong, S. Chiyakun and P. Limsuwan, "Effects of Titanium Sputtering Current on Structure and Morphology of TiZrN Films Prepared by Reactive DC Magnetron Co-Sputtering,"
Materials Sciences and Applications, Vol. 4 No. 11, 2013, pp. 689-694. doi:
10.4236/msa.2013.411086.