Energy Science Division, EcoTopia Science Institute, Nagoya University, Nagoya, Japan
National Institute of Advanced Industrial Science and Technology (AIST), Nagoya, Japan
Japan Atomic Energy Agency (JAEA), Tokai, Japan
Japan Atomic Energy Agency (JAEA), Tokai, Japan
Copyright © 2013 N. Matsunami, H. Kakiuchida, M. Sataka, S. Okayasu et al. This is
an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any
medium, provided the original work is properly cited.
How to Cite this Article
N. Matsunami, H. Kakiuchida, M. Sataka and S. Okayasu, "XRD Characterization of AlN Thin Films Prepared by Reactive RF-Sputter Deposition,"
Advances in Materials Physics and Chemistry, Vol. 3 No. 1A, 2013, pp. 101-107. doi:
10.4236/ampc.2013.31A012.