Journal of Modern Physics

Vol.4 No.3(2013), Paper ID 28655, 5 pages

DOI:10.4236/jmp.2013.43048

 

Effect of Deposition Temperature on the FTIR Absorbance of Zinc Oxide Thin Films Produced by MOCVD

 

U. S. Mbamara, G. A. Alozie, K. B. Okeoma, C. Iroegbu

 

Department of Physics, Federal University of Technology, Owerri, Nigeria
Department of Physics, Federal University of Technology, Owerri, Nigeria
Department of Physics, Federal University of Technology, Owerri, Nigeria
Department of Physics, Federal University of Technology, Owerri, Nigeria

 

Copyright © 2013 U. S. Mbamara, G. A. Alozie, K. B. Okeoma, C. Iroegbu et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article


U. Mbamara, G. Alozie, K. Okeoma and C. Iroegbu, "Effect of Deposition Temperature on the FTIR Absorbance of Zinc Oxide Thin Films Produced by MOCVD," Journal of Modern Physics, Vol. 4 No. 3, 2013, pp. 349-353. doi: 10.4236/jmp.2013.43048.

Copyright © 2024 by authors and Scientific Research Publishing Inc.

Creative Commons License

This work and the related PDF file are licensed under a Creative Commons Attribution 4.0 International License.