Engineering

Vol.4 No.12(2012), Paper ID 25850, 4 pages

DOI:10.4236/eng.2012.412109

 

A Thermochemical Process Using Expanding Plasma for Nitriding Thin Molybdenum Films at Low Temperature

 

Isabelle Jauberteau, Jean Louis Jauberteau, Said Touimi, Thérèse Merle-Méjean, Sylvain Weber, Annie Bessaudou

 

Centre Européen de la Céramique, Limoges, France
Centre Européen de la Céramique, Limoges, France
Centre Européen de la Céramique, Limoges, France
Centre Européen de la Céramique, Limoges, France
Ecole des Mines, Parc de Saurupt, Nancy, France
Université de Limoges, Limoges, France

 

Copyright © 2012 Isabelle Jauberteau, Jean Louis Jauberteau, Said Touimi, Thérèse Merle-Méjean, Sylvain Weber, Annie Bessaudou et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article


Jauberteau, I. , Jauberteau, J. , Touimi, S. , Merle-Méjean, T. , Weber, S. and Bessaudou, A. (2012) A Thermochemical Process Using Expanding Plasma for Nitriding Thin Molybdenum Films at Low Temperature. Engineering, 4, 857-868. doi: 10.4236/eng.2012.412109.

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