Journal of Minerals and Materials Characterization and Engineering

Vol.11 No.7(2012), Paper ID 21313, 6 pages

DOI:10.4236/jmmce.2012.117059

 

Influence of Sputter Deposition Time on the Growth of c-Axis Oriented AlN/Si Thin Films for Microelectronic Application

 

V. VasanthiPillay, K. Vijayalakshmi

 

Department of Physics, Sujatha Degree and PG college for women, Hyderabad, AndhraPradesh, India
Department of Physics, Bishop Heber College, Tiruchirappalli, Tamil Nadu, India

 

Copyright © 2012 V. VasanthiPillay, K. Vijayalakshmi et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article

VasanthiPillay, V. and Vijayalakshmi, K. (2012) Influence of Sputter Deposition Time on the Growth of c-Axis Oriented AlN/Si Thin Films for Microelectronic Application. Journal of Minerals and Materials Characterization and Engineering, 11, 724-729. doi: 10.4236/jmmce.2012.117059.
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