World Journal of Nano Science and Engineering
Vol.2 No.2(2012), Paper ID 20161, 11
pages
DOI:10.4236/wjnse.2012.22012
X-Ray Photoelectron Spectroscopy and Raman Spectroscopy Studies on Thin Carbon Nitride Films Deposited by Reactive RF Magnetron Sputtering
Masao Matsuoka, Sadao Isotani, Ronaldo D. Mansano, Wilmer Sucasaire, Ricardo A. C. Pinto, Juan C. R. Mittani, Kiyoshi Ogata, Naoto Kuratani
Institute of Physics, University of S?o Paulo, S?o Paulo, Brazil
Institute of Physics, University of S?o Paulo, S?o Paulo, Brazil
Polytechnical School, University of S?o Paulo, S?o Paulo, Brazil
Institute of Physics, University of S?o Paulo, S?o Paulo, Brazil
Institute of Physics, University of S?o Paulo, S?o Paulo, Brazil
Institute of Physics, University of S?o Paulo, S?o Paulo, Brazil
Nissin Electric Company, Ltd., Kyoto, Japan
MEMS Development Department, Semiconductor Division, OMRON Corporation, Shiga, Japan
Copyright © 2012 Masao Matsuoka, Sadao Isotani, Ronaldo D. Mansano, Wilmer Sucasaire, Ricardo A. C. Pinto, Juan C. R. Mittani, Kiyoshi Ogata, Naoto Kuratani et al. This is
an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any
medium, provided the original work is properly cited.
How to Cite this Article
M. Matsuoka, S. Isotani, R. Mansano, W. Sucasaire, R. Pinto, J. Mittani, K. Ogata and N. Kuratani, "X-Ray Photoelectron Spectroscopy and Raman Spectroscopy Studies on Thin Carbon Nitride Films Deposited by Reactive RF Magnetron Sputtering,"
World Journal of Nano Science and Engineering, Vol. 2 No. 2, 2012, pp. 92-102. doi:
10.4236/wjnse.2012.22012.