Materials Sciences and Applications

Vol.3 No.2(2012), Paper ID 17248, 4 pages

DOI:10.4236/msa.2012.32010

 

Effect of Ge Incorporation on Bandgap and Photosensitivity of Amorphous SiGe Thin Films

 

Gopal G. Pethuraja, Roger E. Welser, Ashok K. Sood, Changwoo Lee, Nicholas J. Alexander, Harry Efstathiadis, Pradeep Haldar, Jennifer L. Harvey

 

 

Copyright © 2012 Gopal G. Pethuraja, Roger E. Welser, Ashok K. Sood, Changwoo Lee, Nicholas J. Alexander, Harry Efstathiadis, Pradeep Haldar, Jennifer L. Harvey et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article


G. Pethuraja, R. Welser, A. Sood, C. Lee, N. Alexander, H. Efstathiadis, P. Haldar and J. Harvey, "Effect of Ge Incorporation on Bandgap and Photosensitivity of Amorphous SiGe Thin Films," Materials Sciences and Applications, Vol. 3 No. 2, 2012, pp. 67-71. doi: 10.4236/msa.2012.32010.

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