Vol. No.(), Paper ID 14146, 5 pages

DOI:

 

Situation and Development of the Material Used for Anti-Counterfeiting

 

Cheng-fu Zheng, Nian-wu Li, Shi-hui Zhu, Xing-jun Lv, Fan-di Zeng

 

National Anti-Counterfeit Engineering Research Center, Wuhan, China
National Anti-Counterfeit Engineering Research Center, Wuhan, China
National Anti-Counterfeit Engineering Research Center, Wuhan, China
HuaGong Image Technology &Development Co.,Ltd, Wuhan, China
College of Chemistry and Chemical Engineering, Huazhong University of Science and Technology, Wuhan, China School of Physics Science and Technology, Xinjiang University, Urumqi, Xinjiang, 830046

 

Copyright © Cheng-fu Zheng, Nian-wu Li, Shi-hui Zhu, Xing-jun Lv, Fan-di Zeng et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

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