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Proceedings of the 7th National Conference on Functional Materials and Applications (FMA 2010 E-BOOK)

Changsha,China,10.16-10.18,2010

ISBN: 978-1-935068-41-9 Scientific Research Publishing, USA

E-Book 2313pp Pub. Date: October 2010

Category: Chemistry & Materials Science

Price: $360

Title: Effects of Sputtering Power on Structure and Properties of VO2 Thin Films Prepared by Magnetron Sputtering
Source: Proceedings of the 7th National Conference on Functional Materials and Applications (FMA 2010 E-BOOK) (pp 1208-1211)
Author(s): Feng-yue Luo, School of Materials Science and Engineering, Sichuan University, Chengdu, China
Wei-gang Huang, School of Materials Science and Engineering, Sichuan University, Chengdu, China
Abstract: The effects of sputtering power on structure and properties of VO2 thin films deposited onto the glass substrates have been studied. The structure, phase transition character and valence state of VO2 thin films obtained in different sputtering power were analyzed by XRD, FTIR and XPS, The films’ surface morphology was studied by AFM. The results show that, with the increases of the sputtering power, the crystalline of the VO2 thin films is improved. Thin films deposited in 220 w exhibit good crystalline states and phase transition character. When the sputtering power is above 220 w, the crystalline and phase transition character of VO2 thin films tend to lower. The VO2 thin films deposited in different power have a (110) preferential orientation. High sputtering power results in more numerous film particles, smaller particle size and nonuniform size distribution.
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